Highly Sensitive Wide Bandwidth Photodetector Based on Internal Photoemission in CVD Grown p-Type MoS2/Graphene Schottky Junction
Source abstract
Abstract
Two dimensional (2D) Molybdenum disulfide (MoS2) has evolved as a promising material for next generation optoelectronic devices owing to its unique electrical and optical properties, such as band gap modulation, high optical absorption, and increased luminescence quantum yield. The 2D MoS2 photodetectors reported in the literature have presented low responsivity compared to silicon based photodetectors. In this study, we assembled atomically thin p-type MoS2 with graphene to form a MoS2/graphene Schottky photodetector where photo generated holes travel from graphene to MoS2 over the Schottky barrier under illumination. We found that the p-type MoS2 forms a Schottky junction with graphene with a barrier height of 139 meV, which results in high photocurrent and wide spectral range of detection with wavelength selectivity. The fabricated photodetector showed excellent photosensitivity with a maximum photo responsivity of 1.26 AW(-1) and a noise equivalent power of 7.8 × 10(-12) W/√Hz at 1440 nm.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Nanowire Synthesis and Applications · Transition Metal Oxide Nanomaterials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
INSYST Laboratory, Electrical and Computer Engineering, Florida International University, Miami, Florida 33174, United States
Nanomaterials and Device Laboratory, Department of Materials Science and Engineering, University of North Texas, Denton, Texas 76207, United States
Funding
National Science Foundation · University Graduate School, Florida International University
References (44)
Show source-provided references
1. 10.1038/nnano.2009.29210.1038/nnano.2009.292 ↗
2. 10.1063/1.487226710.1063/1.4872267 ↗
3. 10.1038/nphoton.2010.18610.1038/nphoton.2010.186 ↗
4. 10.1021/nl201906810.1021/nl2019068 ↗
5. 10.1038/nphoton.2013.24010.1038/nphoton.2013.240 ↗
6. 10.1038/nnano.2014.3110.1038/nnano.2014.31 ↗
7. 10.1021/nn400570410.1021/nn4005704 ↗
8. 10.1038/nnano.2014.21510.1038/nnano.2014.215 ↗
9. 10.1103/PhysRevLett.105.13680510.1103/PhysRevLett.105.136805 ↗
10. 10.1021/nn202455710.1021/nn2024557 ↗
11. 10.1002/adma.20120190910.1002/adma.201201909 ↗
12. 10.1021/nn305301b10.1021/nn305301b ↗
13. 10.1038/nnano.2013.10010.1038/nnano.2013.100 ↗
14. 10.1109/LED.2011.216061110.1109/LED.2011.2160611 ↗
15. 10.1109/JPROC.2013.225343510.1109/JPROC.2013.2253435 ↗
16. 10.1002/anie.20130747510.1002/anie.201307475 ↗
17. 10.1038/nnano.2012.22410.1038/nnano.2012.224 ↗
18. 10.1038/nnano.2013.20610.1038/nnano.2013.206 ↗
19. 10.1038/srep0382610.1038/srep03826 ↗
20. 10.1021/nn305913610.1021/nn3059136 ↗
21. 10.1002/smll.20130013410.1002/smll.201300134 ↗
22. 10.1021/am506198b10.1021/am506198b ↗
23. 10.1002/adfm.20110119110.1002/adfm.201101191 ↗
24. 10.1021/ar500280m10.1021/ar500280m ↗
25. 10.1002/adfm.20110211110.1002/adfm.201102111 ↗
26. 10.1038/nnano.2013.4610.1038/nnano.2013.46 ↗
27. 10.1016/j.physrep.2009.02.00310.1016/j.physrep.2009.02.003 ↗
28. 10.1021/nl400516a10.1021/nl400516a ↗
29. 10.1021/nl903868w10.1021/nl903868w ↗
30. 10.1038/srep0265710.1038/srep02657 ↗
31. Ye Y. · 201410.1364/CLEO_SI.2014.STh4B.4 ↗
32. 10.1002/adma.20130124410.1002/adma.201301244 ↗
33. 10.1063/1.480186110.1063/1.4801861 ↗
34. 10.1103/PhysRevB.87.16540210.1103/PhysRevB.87.165402 ↗
35. 10.1002/anie.20110600410.1002/anie.201106004 ↗
36. 10.1002/smll.20110265410.1002/smll.201102654 ↗
37. 10.1103/PhysRevX.2.01100210.1103/PhysRevX.2.011002 ↗
38. Schroder D. K. · 2006
39. 10.1063/1.9735910.1063/1.97359 ↗
40. 10.1021/nl404350510.1021/nl4043505 ↗
41. Ng, Kwok. K.Complete Guide to Semiconductor Devices;J. Wiley & Sons:New York, NY, pp439–444.
42. 10.1063/1.299075310.1063/1.2990753 ↗
43. 10.1088/0268-1242/23/7/07500110.1088/0268-1242/23/7/075001 ↗
44. 10.1063/1.138519110.1063/1.1385191 ↗