Preparation and characterization of La_(0.9)Sr_(0.1)Ga_(0.8)Mg_(0.2)O_(3-δ) thin film deposited by RF magnetron sputtering
Source abstract
Abstract
A dense and crack-free La0.9Sr0.1Ga0.8Mg0.2O3-δ thin film has been prepared by RF magnetron sputtering method on porous LSCM7355 anode substrates.The film with the good apparent morphology and a thickness about 10μm was obtained when the operating parameters fixed as follows: the sputtering power is 210W,the temperature of substrates is 300℃,the sputtering pressure is 5Pa and the sputtering time span is 12h.The polycrystalline perovskite type structure was obtained after the film annealed at 1000℃ for 2h in air.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advancements in Solid Oxide Fuel Cells · Magnetic and transport properties of perovskites and related materials · Physics of Superconductivity and Magnetism
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