journal article·2024-12Open access

Full Picture of Lattice Deformation in a Ge 1 − x Sn x Micro‐Disk by 5D X‐ray Diffraction Microscopy

Cedric Corley‐Wiciak, Marvin H. Zoellner, Agnieszka A. Corley‐Wiciak, Fabrizio Rovaris, Edoardo Zatterin, Ignatii Zaitsev, Gianfranco Sfuncia, Giuseppe Nicotra, Davide Spirito, Nils von den Driesch, Costanza L. Manganelli, Anna Marzegalli, Tobias U. Schulli, Dan Buca, Francesco Montalenti, Giovanni Capellini, Carsten Richter

Small Methods· Volume 8· Issue 12

Abstract

Abstract Lattice strain in crystals can be exploited to effectively tune their physical properties. In microscopic structures, experimental access to the full strain tensor with spatial resolution at the (sub‐)micrometer scale is at the same time very interesting and challenging. In this work, how scanning X‐ray diffraction microscopy, an emerging model‐free method based on synchrotron radiation, can shed light on the complex, anisotropic deformation landscape within three dimensional (3D) microstructures is shown. This technique allows the reconstruction of all lattice parameters within any type of crystal with submicron spatial resolution and requires no sample preparation. Consequently, the local state of deformation can be fully quantified. Exploiting this capability, all components of the strain tensor in a suspended, strained Ge 1 − x Sn x /Ge microdisk are mapped. Subtle elastic deformations are unambiguously correlated with structural defects, 3D microstructure geometry, and chemical variations, as verified by comparison with complementary electron microscopy and finite element simulations. The methodology described here is applicable to a wide range of fields, from bioengineering to metallurgy and semiconductor research.
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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Semiconductor materials and interfaces · Near-Field Optical Microscopy

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

European Synchrotron Radiation Facility 71 avenue des Martyrs, CS 40220 Grenoble Cedex 9 38043 France

Leibniz‐Institut für innovative Mikroelektronik Im Technologiepark 25 15236 Frankfurt(Oder) Germany

RWTH Aachen 52062 Aachen Germany

L‐NESS and Department of Materials Science University of Milano‐Bicocca Via Roberto Cozzi 55 20125 Milano Italy

CNR‐IMM Zona Industriale Strada VIII,5 Catania 95121 Italy

Peter Grünberg Institute 10 (PGI 10) and JARA‐Fundamentals of Future Information Technologies Forschungszentrum Jülich 52425 Jülich Germany

Peter Grünberg Institute 9 (PGI 9) and JARA‐Fundamentals of Future Information Technologies Forschungszentrum Jülich 52425 Jülich Germany

Dipartimento di Scienze Universita Roma Tre Roma 00146 Italy

IKZ – Leibniz ‐Institut für Kristallzüchtung Max‐Born‐Straße 2 12489 Berlin Germany

Funding

Deutsche Forschungsgemeinschaft

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