journal article·1996-06-01

Point-contact measurements for high-resolution profiling of high-resistivity III - V semiconductors

W Siegel, G Kühnel, J R Niklas, M Jurisch, B Hoffman

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Abstract

A point-contact technique operating at low forward bias was used for high-resolution profiling of semi-insulating GaAs and InP as well as of medium-resistivity undoped n-type GaAs. Electrical mesoscopic non-uniformities strongly correlated to the cellular structure of dislocations could be detected in LEC GaAs and VGF GaAs. Between the profiles of the point-contact current and of the band - band photoluminescence intensity a close correlation was observed on nearly all LEC GaAs samples and on InP. In the case of VGF GaAs, on the contrary, an anticorrelation exists.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Silicon and Solar Cell Technologies · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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