Ambipolar field-effect transistors by few-layer InSe with asymmetry contact metals
Source abstract
Abstract
Group IIIA−VIA layered semiconductors (MX, where M = Ga and In, X = S, Se, and Te) have attracted tremendous interest for their anisotropic optical, electronic, and mechanical properties. In this study, we demonstrated that metal and InSe junctions can lead to carrier behaviors in few-layered InSe FETs. These results indicate that the polarity of few-layered InSe FETs can be determined by using metals with different work functions. We adopted FET S/D metal contacts with asymmetric work functions to reduce the Schottky barriers of electrons and holes, and discovered that few-layered InSe FETs with carefully selected metal contacts can achieve ambipolar behaviors. These results indicate that group IIIA−VIA layered semiconductor FETs with asymmetry contact metals have great potential for applications in photovoltaic devices, optical sensors, and CMOS inverter circuits.
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Research context
OpenAlex topics: 2D Materials and Applications · Chalcogenide Semiconductor Thin Films · Semiconductor materials and interfaces
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Applied Materials and Optoelectronic Engineering, National Chi Nan University 1 , No.1, University Road, Puli, Nantou 545, Taiwan, R.O.C
Center for Condensed Matter Sciences, National Taiwan University 2 , No. 1, Sec. 4, Roosevelt Road, Taipei 106, Taiwan, R.O.C
References (10)
Show source-provided references
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