journal article·2026-01-16

Automating abatement destruction or removal efficiency measurements in the semiconductor industry

Aaron D. Martinez, David A. Palsulich, Casey J. L. Johnson, Rahul Kumar Singh, Sachin D. Padghan, Soumya Mandal, Cristina Marini

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Abstract

BackgroundSemiconductor manufacturing emits high global warming potential greenhouse gases. Measuring the destruction or removal efficiency (DRE) of point-of-use abatement systems is essential to account for gains realized by emissions reduction initiatives, but the traditional approach of hiring a third-party to perform these measurements is expensive and slow.AimThe focus of this project was the development of an in-house DRE measurement system that automates data collection, analysis, and reporting, aligned with the protocol Environmental Protection Agency (EPA) 430-R-10-003 but faster and more cost-effective than third-party measurement.ApproachThis development was achieved by identifying key requirements based on the EPA protocol, surveying available technologies, selecting an instrumentation supplier to collaborate with, and iterating on the design to achieve the specified requirements.ResultsA system was developed that enabled in-house real-time DRE measurement and reporting—significantly reducing cost, personnel hours, and equipment downtime required to perform these measurements on a large scale.ConclusionsThis system makes it feasible and cost-effective to measure the substantial number of abatement units required to determine actual abatement efficiencies and realize gains achieved from emissions reduction initiatives.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Photovoltaic Systems and Sustainability · Recycling and Waste Management Techniques · Vehicle emissions and performance

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Affiliations

Micron Technology Inc., Boise, Idaho, United States

Micron Semiconductor Asia Operations Pte Ltd., Singapore, Singapore

Micron Semiconductor Italia S.r.l., Avezzano, Italy

References

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