Automating abatement destruction or removal efficiency measurements in the semiconductor industry
Source abstract
Abstract
BackgroundSemiconductor manufacturing emits high global warming potential greenhouse gases. Measuring the destruction or removal efficiency (DRE) of point-of-use abatement systems is essential to account for gains realized by emissions reduction initiatives, but the traditional approach of hiring a third-party to perform these measurements is expensive and slow.AimThe focus of this project was the development of an in-house DRE measurement system that automates data collection, analysis, and reporting, aligned with the protocol Environmental Protection Agency (EPA) 430-R-10-003 but faster and more cost-effective than third-party measurement.ApproachThis development was achieved by identifying key requirements based on the EPA protocol, surveying available technologies, selecting an instrumentation supplier to collaborate with, and iterating on the design to achieve the specified requirements.ResultsA system was developed that enabled in-house real-time DRE measurement and reporting—significantly reducing cost, personnel hours, and equipment downtime required to perform these measurements on a large scale.ConclusionsThis system makes it feasible and cost-effective to measure the substantial number of abatement units required to determine actual abatement efficiencies and realize gains achieved from emissions reduction initiatives.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Photovoltaic Systems and Sustainability · Recycling and Waste Management Techniques · Vehicle emissions and performance
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Micron Technology Inc., Boise, Idaho, United States
Micron Semiconductor Asia Operations Pte Ltd., Singapore, Singapore
Micron Semiconductor Italia S.r.l., Avezzano, Italy
References
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