journal article·2025-02Open access

Microstructural Underpinnings of Giant Intrinsic Exchange Bias in Epitaxial NiCo2O4 Thin Films

Detian Yang, Arjun Subedi, Chao Liu, Haile Ambaye, Valeria Lauter, Peter A. Dowben, Yaohua Liu, Xiaoshan Xu

Advanced Electronic Materials· Volume 11· Issue 2

Abstract

Abstract Understanding intrinsic exchange bias in nominally single‐component ferromagnetic or ferrimagnetic materials is crucial for simplifying related device architectures. However, the mechanisms behind this phenomenon and its tunability remain elusive, which hinders the efforts to achieve unidirectional magnetization for widespread applications. Inspired by the high tunability of ferrimagnetic inverse spinel NiCo2O4, the origin of intrinsic exchange bias in NiCo2O4 (111) films deposited on Al2O3 (0001) substrates are investigated. The comprehensive characterizations, including electron diffraction, X‐ray reflectometry and spectroscopy, and polarized neutron reflectometry, reveal that intrinsic exchange bias in NiCo2O4 (111)/Al2O3 (0001) arises from a reconstructed antiferromagnetic rock‐salt NixCo1‐xO layer at the interface between the film and the substrate due to a significant structural mismatch. Remarkably, by engineering the interfacial structure under optimal growth conditions, it can achieve exchange bias larger than coercivity, leading to unidirectional magnetization. Such giant intrinsic exchange bias can be utilized for realistic device applications. This work establishes a new material platform based on NiCo2O4, an emergent spintronics material, to study tunable interfacial magnetic and spintronic properties.
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Research context

OpenAlex topics: Magnetic properties of thin films · Magnetic Properties and Synthesis of Ferrites · Magnetic and transport properties of perovskites and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics and Astronomy and the Nebraska Center for Materials and Nanoscience University of Nebraska‐Lincoln 855 N16th St Lincoln NE 68588 USA

Department of Materials Science and Engineering National University of Singapore Singapore 117575 Singapore

Neutron Scattering Division Oak Ridge National Laboratory Oak Ridge TN 37830 USA

Second Target Station Oak Ridge National Laboratory Oak Ridge TN 37830 USA

Funding

National Science Foundation

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