Hybrid bilayer gate dielectric-based organic thin film transistors
Source abstract
Abstract
Organic thin film transistors (OTFTs) are key building blocks for flexible, low cost electronics systems. They provide a viable alternative for silicon-based electronics with added advantages of low cost and flexibility. However, few issues like high-operating voltage, low-switching speed, high-leakage current and reliability are still a challenge. The overall performance of an OTFT depends on organic semiconductors and gate dielectric interface. In this paper, we review the current status and trends in the choice of dielectric layer for OTFTs. As a starting point, the performance parameters of an OTFT and their dependence on the dielectric layer are briefly discussed. A variety of dielectric materials which includes high-k inorganic, organic, surface coated inorganics and nanocomposites are also presented. The advantages and drawbacks of each of these materials are discussed in detail. We reviewed the latest developments in the dielectric materials especially, self-assembled monolayers (SAMs), hybrid bilayers and nanocomposites. SAM-based OTFTs offer several advantages but shift in the threshold voltage remains a concern. Nanocomposites are a latest addition to the dielectric materials, which offer advantages like solution processing and improved dielectric constant but have a rough surface. A hybrid bilayer that incorporates the inorganic dielectric as a base layer and a thin polymer layer over it to improve the surface properties offers several desirable characteristics over the other choices. Hence, we propose that hybrid bilayer gate dielectrics shall play a pivotal role in improving the OTFT performance.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Organic Electronics and Photovoltaics · Organic Light-Emitting Diodes Research · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (100+)
Show source-provided references
1. Ryu G S, Kim J S, Jeong S H and Song C K 2013 Org. Electron. Phys. Mater. Appl. 14 1218
2. Cantatore E, Geuns T C T, Gelinck G H, Van Veenendaal E, Gruijthuijsen A F A, Schrijnemakers L et al 2007 IEEE J. Solid-State Circuits 42 8410.1109/JSSC.2006.886556 ↗
3. Sokolov A N, Tee B C K, Bettinger C J, Tok J B H and Bao Z 2012 Acc. Chem. Res. 45 36110.1021/ar2001233 ↗
4. Ling Q D, Liaw D J, Zhu C, Chan D S H, Kang E T and Neoh K G 2008 Prog. Polym. Sci. 33 91710.1016/j.progpolymsci.2008.08.001 ↗
5. Pantisano L, Blomme P, Kaczer B, Groeseneken G and Akinwande A I 2005 IEEE J. Solid-State Circuits 52 2819
6. Zaumseil J and Sirringhaus H 2007 Chem. Rev. 107 129610.1021/cr0501543 ↗
7. Stallinga P 2011 Adv. Mater. 23 335610.1002/adma.201101129 ↗
8. Zschieschang U, Ante F, Kälblein D, Yamamoto T, Takimiya K, Kuwabara H et al 2011 Org. Electron. 12 37010.1016/j.orgel.2011.04.018 ↗
9. Melville O A, Lessard B H and Bender T P 2015 ACS Appl. Mater. Interfaces 7 1310510.1021/acsami.5b01718 ↗
10. Choe Y, Hye M, Kim J, Ryu G, Noh Y, Ho Y et al 2016 Org. Electron. 36 17110.1016/j.orgel.2016.06.002 ↗
11. Deng L F, Tang W M, Leung C H, Lai P T, Xu J P and Chec C M 2008 Electron devices solid-state circuits 2008 EDSSC 2008 IEEE Int. Conf. 1
12. Li J, Zhao Y, Tan H S, Guo Y, Di C A, Yu G et al 2012 Sci. Rep. 2 75410.1038/srep00754 ↗
13. Tang W, Li J, Zhao J, Zhang W, Yan F and Guo X 2015 IEEE Electron. Device Lett. 36 95010.1109/LED.2015.2462833 ↗
14. Katz H E and Bao Z 2000 J. Phys. Chem. B 104 67110.1021/jp992853n ↗
15. Yi M, Guo Y, Guo J, Yang T, Chai Y, Fan Q et al 2014 J. Mater. Chem. C 2 299810.1039/C3TC32460E ↗
16. Kim J W, Oh J D, Kim D, Lee H Y, Ha Y G and Choi J H 2016 J. Mater. Chem. C 4 799910.1039/C6TC02851A ↗
17. Huang T H, Liu K C, Pei Z, Lin W K and Chang S T 2011 Org. Electron. Phys., Mater. Appl. 12 152710.1016/j.orgel.2011.05.014 ↗
18. Kraft U, Sejfi M, Kang M J, Takimiya K, Zaki T, Letzkus F et al 2015 Adv. Mater. 27 998
19. Wrachien N, Cester A, Lago N, Rizzo A, D’Alpaos R, Stefani A et al 2015 Solid State Electron. 113 15110.1016/j.sse.2015.05.028 ↗
20. Fan C L, Chiu P C, Lin Y Z, Yang T H and Chiang C Y 2011 Semicond. Sci. Technol. 26 12500710.1088/0268-1242/26/12/125007 ↗
21. Chen H M, Chang T C, Tai Y H, Chiang H C, Liu K H, Chen M C et al 2016 IEEE Electron. Device Lett. 37 22810.1109/LED.2015.2508760 ↗
22. Roichman Y and Tessler N 2002 Appl. Phys. Lett. 80 15110.1063/1.1431691 ↗
23. Feng L, Xu X and Guo X 2011 ECS Trans. 37 10510.1149/1.3600730 ↗
24. Mittal P, Negi Y S and Singh R K 2016 Microelectron. Eng. 150 710.1016/j.mee.2015.10.014 ↗
25. Shim C, Maruoka F and Hattori R 2010 IEEE Trans. Electron. Devices 57 19510.1109/TED.2009.2035540 ↗
26. Li C, Pan F, Wang X, Wang L, Wang H, Wang H et al 2009 Org. Electron. 10 94810.1016/j.orgel.2009.05.001 ↗
27. Zocco A T, You H, Hagen J A and Steckl A J 2014 Nanotechnology 25 09455010.1088/0957-4484/25/9/094005 ↗
28. Zhou Y, Fuentes-hernandez C, Shim J, Meyer J, Giordano A J, Li H et al 2012 Science 336 32710.1126/science.1218829 ↗
29. Kumar B, Kaushik B K and Negi Y S 2014 J. Mater. Sci. Mater. Electron. 25 110.1007/s10854-013-1550-2 ↗
30. Dimitrakopoulos C D and Malenfant P R L 2002 Adv. Mater. 14 9910.1002/1521-4095(20020116)14:2<99::AID-ADMA99>3.0.CO;2-9 ↗
31. Kumar Singh V and Mazhari B 2013 Appl. Phys. Lett. 102 25330410.1063/1.4812191 ↗
32. Meijer E J, Tanase C, Blom P W M, Van Veenendaal E, Huisman B H, De Leeuw D M et al 2002 Appl. Phys. Lett. 80 383810.1063/1.1479210 ↗
33. Horowitz G, Hajlaoui M E and Hajlaoui R 2000 J. Appl. Phys. 87 445610.1063/1.373091 ↗
34. Cui Q, Gu C, Liu J, Feng L, Wang S and Guo X 2014 J. Disp. Technol. 10 61510.1109/JDT.2014.2309860 ↗
35. Horowitz B G, Lang P, Mottaghi M and Aubin H 2004 Adv. Funct. Mater. 14 106910.1002/adfm.200305122 ↗
36. Marinov O, Jamal Deen M, Feng C and Wu Y 2014 J. Appl. Phys. 115 34506110.1063/1.4862043 ↗
37. Cheng S S, Yang C Y, Ou C W, Chuang Y C, Wu M C and Chu C W 2008 Electrochem. Solid-State Lett. 11 H11810.1149/1.2844285 ↗
38. Kalb W L and Batlogg B 2010 Phys. Rev. B - Condens. Matter Mater. Phys. 81 1
39. Liu Z, Oh J H, Roberts M E, Wei P, Paul B C and Okajima M 2009 Appl. Phys. Lett. 94 132
40. Seong H, Baek J, Pak K and Im S G 2015 Adv. Funct. Mater. 25 446210.1002/adfm.201500952 ↗
41. Kim S Y, Ahn T, Pyo S and Yi M 2009 Curr. Appl. Phys. 9 91310.1016/j.cap.2008.09.003 ↗
42. Yuan G C, Xu Z, Gong C, Cai Q J, Lu Z S, Shi J S et al 2009 Appl. Phys. Lett. 94 15110510.1063/1.3115145 ↗
43. Wang W, Han J, Ying J, Xiang L and Xie W 2014 Appl. Phys. Lett. 105 1
44. Dimitrakopoulos C D 1999 Science 283 82210.1126/science.283.5403.822 ↗
45. Lee J B, Chang P C, Liddle J A and Subramanian V 2005 IEEE Trans. Electron. Devices 52 187410.1109/TED.2005.851845 ↗
46. Islam M N 2011 J. Appl. Phys. 110 114906110.1063/1.3603022 ↗
47. Kim H, Bae J H, Lee S D and Horowitz G 2012 Org. Electron. Phys., Mater. Appl. 13 1255
48. Seol Y G, Noh H Y, Lee S S, Ahn J H and Lee N E 2008 Appl. Phys. Lett. 93 1
49. Hengen S, Alt M, Hernandez-Sosa G, Giehl J, Lemmer U and Mechau N 2014 Org. Electron. 15 82910.1016/j.orgel.2013.12.022 ↗
50. Wang W, Ma D, Pan S and Yang Y 2012 Appl. Phys. Lett. 101 03190110.1063/1.4737397 ↗
51. Ha T J 2014 Appl. Phys. Lett. 105 114
52. Noh Y H, Young Park S, Seo S M, Lee H H, Park S Y, Seo S M et al 2006 Org. Electron. Phys., Mater. Appl. 7 271
53. Huang T H, Pei Z, Lin W K, Chang S T and Liu K C 2010 Thin Solid Films 518 738110.1016/j.tsf.2010.05.012 ↗
54. Diemer P J, Hayes J, Welchman E, Hallani R, Pookpanratana S J, Hacker C A et al 2017 Adv. Electron. Mater. 3 160029410.1002/aelm.201600294 ↗
55. Orgiu E, Locci S, Fraboni B, Scavetta E, Lugli P and Bonfiglio A 2011 Org. Electron. Phys., Mater. Appl. 12 477
56. Lee S, Koo B, Shin J, Lee E, Park H and Kim H 2006 Appl. Phys. Lett. 88 16210910.1063/1.2196475 ↗
57. Veres J, Ogier S, Lloyd G and De Leeuw D 2004 Chem. Mater. 16 454310.1021/cm049598q ↗
58. Ortiz P, Facchetti A and Marks T J 2010 Chem. Rev. 110 20510.1021/cr9001275 ↗
59. Facchetti A, Yoon M H and Marks T J 2005 Adv. Mater. 17 170510.1002/adma.200500517 ↗
60. Bersuker G, Zeitzoff P, Brown G and Huff H R 2004 Mater. Today 7 2610.1016/S1369-7021(04)00052-5 ↗
61. Tan H S, Cahyadi T, Wang Z B, Lohani A, Tsakadze Z, Zhang S et al 2008 IEEE Electron. Device Lett. 29 69810.1109/LED.2008.922315 ↗
62. Lin Y J, Tsao H Y and Liu D S 2015 J. Mater. Sci. Mater. Electron. 26 257910.1007/s10854-015-2726-8 ↗
63. Koo J B, Ku C H, Lim S C, Kim S H and Lee J H 2007 Appl. Phys. Lett. 90 2005
64. Ali K, Kim C Y and Choi K H 2014 J. Mater. Sci. Mater. Electron. 25 192210.1007/s10854-014-1821-6 ↗
65. Yoon W J and Berger P R 2010 Org. Electron. Phys., Mater. Appl. 11 1719
66. Wei C Y, Kuo S H, Hung Y M, Huang W C, Adriyanto F and Wang Y H 2011 IEEE Electron. Device Lett. 32 9010.1109/LED.2010.2084559 ↗
67. He W, Xu W, Peng Q, Liu C, Zhou G, Wu S et al 2016 J. Phys. Chem. C 120 994910.1021/acs.jpcc.6b03638 ↗
68. Bartic C, Jansen H, Campitelli A and Borghs S 2002 Org. Electron. 3 6510.1016/S1566-1199(02)00034-4 ↗
69. Lu Y, Lee W H, Lee H S, Jang Y, Cho K, Lu Y et al 2009 Appl. Phys. Lett. 94 85
70. Yun Y, Pearson C and Petty M C 2009 J. Appl. Phys. 105 03450810.1063/1.3075616 ↗
71. Klauk H 2010 Chem. Soc. Rev. 39 264310.1039/b909902f ↗
72. Veres J, Ogier S D, Leeming S W, Cupertino D C and Khaffaf S M 2003 Adv. Funct. Mater. 13 19910.1002/adfm.200390030 ↗
73. Yang S Y, Shin K and Park C E 2005 Adv. Funct. Mater. 15 180610.1002/adfm.200400486 ↗
74. Jeong S, Kim D, Lee S, Park B K and Moon J 2006 Appl. Phys. Lett. 89 9210110.1063/1.2338753 ↗
75. Klauk H, Halik M, Zschieschang U, Schmid G, Radlik W and Weber W 2002 J. Appl. Phys. 92 525910.1063/1.1511826 ↗
76. Kato Y, Iba S, Teramoto R, Sekitani T, Someya T, Kawaguchi H et al 2004 Appl. Phys. Lett. 84 378910.1063/1.1739508 ↗
77. Choi J, Seong H, Pak K and Im S G 2016 J. Inf. Disp. 17 4310.1080/15980316.2016.1171803 ↗
78. Ng T N, Daniel J H, Sambandan S, Arias A C, Chabinyc M L and Street R A 2008 J. Appl. Phys. 103 4450610.1063/1.2884535 ↗
79. Dibenedetto B S A, Facchetti A, Ratner M A, Marks T J, DiBenedetto S A, Facchetti A et al 2009 Adv. Mater. 21 140710.1002/adma.200803267 ↗
80. Novak M, Jager C M, Rumpel A, Kropp H, Peukert W, Clark T et al 2010 Org. Electron. Phys., Mater. Appl. 11 1476
81. Deman A L and Tardy J 2005 Org. Electron. Phys., Mater. Appl. 6 78
82. Deng L F, Lai P T, Chen W B, Xu J P, Liu Y R, Choi H W et al 2011 IEEE Electron. Device Lett. 32 9310.1109/LED.2010.2087314 ↗
83. Kim J M, Lee J W, Kim J K, Ju B K, Kim J S, Lee Y H et al 2004 Appl. Phys. Lett. 85 636810.1063/1.1841470 ↗
84. Roh J, Lee C, Kwak J, Jung B J and Kim H, 2015 J. Korean Phys. Soc. 67 94110.3938/jkps.67.941 ↗
85. Pernstich K P, Haas S, Oberhoff D, Goldmann C, Gundlach D J, Batlogg B et al 2004 J. Appl. Phys. 96 643110.1063/1.1810205 ↗
86. Yu S H, Cho J, Ha J U and Chung D S 2017 Org. Electron. 41 32710.1016/j.orgel.2016.11.024 ↗
87. Ma H, Acton O, Ting G, Ka J W, Yip H, Tucker N et al 2008 Appl. Phys. Lett. 92 1
88. Acton O, Ii G T, Ma H, Hutchins D, Wang Y, Purushothaman B et al 2009 J. Mater. Chem. C 19 792910.1039/b909484a ↗
89. Aghamohammadi M, Ro R, Zschieschang U, Ocal C, Boschker H, Weitz R T et al 2015 Appl. Mater. Interfaces 7 2277510.1021/acsami.5b02747 ↗
90. Liu D, Xu X, Su Y, He Z, Xu J and Miao Q 2013 Angew. Chem. — Int. Ed. 52 622210.1002/anie.201300353 ↗
91. Jinno H, Yokota T, Matsuhisa N, Kaltenbrunner M, Tachibana Y and Someya T 2017 Org. Electron. Phys., Mater. Appl. 40 58
92. Salinas M, Jäger C M, Amin A Y, Dral P O, Meyer-friedrichsen T, Hirsch A et al 2012 J. Am. Chem. Soc. 134 1264810.1021/ja303807u ↗
93. Seo J H, Kwon J H, Shin S I, Suh K S, Ju B K, Seo J H et al 2007 Semicond. Sci. Technol. 22 103910.1088/0268-1242/22/9/011 ↗
94. Wang Y, Acton O, Ting G, Weidner T, Ma H, Castner D G et al 2009 Appl. Phys. Lett. 95 073505
95. Park J H, Lee H S, Lee J, Lee K, Lee G, Yoon K H et al 2012 Phys. Chem. Chem. Phys. 14 1420210.1039/c2cp41544e ↗
96. Fukuda K, Suzuki T, Kobayashi T, Kumaki D and Tokito S 2013 Phys. Status Solidi 210 83910.1002/pssa.201228811 ↗
97. Held M, Schießl S P, Miehler D, Gannott F and Zaumseil J 2015 Appl. Phys. Lett. 107 110.1063/1.4929461 ↗
98. Sun Q J, Zhuang J, Yan Y, Zhou Y, Han S T, Zhou L et al 2016 Phys. Status Solidi. Appl. Mater. Sci. 213 7910.1002/pssa.201532380 ↗
99. Lee W H, Wang C C and Ho J C 2009 Thin Solid Films 517 530510.1016/j.tsf.2009.03.156 ↗
100. Kim Y J, Kim J, Kim Y S and Lee J K 2013 Org. Electron. Phys., Mater. Appl. 14 3406