journal article·1993-01

Sputter induced resonant ionization spectroscopy for trace analysis in silicon

L. Johann, R. Stuck, Ph. Kern, B. Sipp, P. Siffert

Applied Surface Science· Volume 63· Issue 1-4
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis · Analytical chemistry methods development

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References (12)

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12. Gobert · J. Appl. Phys. · 1991 · 70 · 1210.1063/1.349716 ↗