A stable TiN reactive sputtering deposition process
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Abstract
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Ion-surface interactions and analysis
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References (12)
Show source-provided references
1. Wittmer · Thin Solid Films · 1982 · 93 · 39710.1016/0040-6090(82)90145-6 ↗
2. Sundgren · Thin Solid Films · 1983 · 105 · 35310.1016/0040-6090(83)90318-8 ↗
3. Noel · J. Vacuum Sci. Technol. A · 1984 · 2 · 28410.1116/1.572582 ↗
4. Ellwanger · Thin Solid Films · 1988 · 161 · 28910.1016/0040-6090(88)90261-1 ↗
5. Berg · J. Vacuum Sci. Technol. A · 1987 · 5 · 20210.1116/1.574104 ↗
6. Sundgren · Surface Sci. · 1983 · 128 · 26510.1016/S0039-6028(83)80031-4 ↗
7. Spencer · Thin Solid Films · 1988 · 158 · 14110.1016/0040-6090(88)90310-0 ↗
8. Berg · J. Appl. Phys. · 1988 · 63 · 88710.1063/1.340030 ↗
9. Sundgren · Thin Solid Films · 1983 · 105 · 38510.1016/0040-6090(83)90320-6 ↗
10. Bland · J. Vacuum Sci. Technol. · 1974 · 11 · 67110.1116/1.1312733 ↗
11. Pointevin · Thin Solid Films · 1982 · 97 · 67
12. Thornton · J. Vacuum Sci. Technol. · 1974 · 11 · 66610.1116/1.1312732 ↗