journal article·1989-09

Formation of buried CoSi2 layers by ion implantation and their stability at high temperatures

M.F. Wu, A. Vantomme, H. Pattyn, G. Langouche, K. Maex, J. Vanhellemont

Applied Surface Science· Volume 38· Issue 1-4
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Abstract

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Research context

OpenAlex topics: Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and interfaces

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References (15)

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14. Backscattering Spectroscopy
15. A. Vantomme, M.F. Wu, I. Dézsi and G. Langouche, paper will be presented at E-MRS Spring Meeting.