journal article·1989-01

Low temperature oxidation of crystalline silicon using excimer laser irradiation

Vishal Nayar, Ian W. Boyd, F.N. Goodall, G. Arthur

Applied Surface Science· Volume 36· Issue 1-4
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Laser Material Processing Techniques · Thin-Film Transistor Technologies

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References (11)

Show source-provided references
1. Boyd · 1987
2. Schafer · J. Vacuum Sci. Technol. · 1982 · 21 · 42310.1116/1.571669 ↗
3. Young · Appl. Phys. Letters · 1987 · 50 · 8010.1063/1.97825 ↗
4. Fogarassy · Phil. Mag. B · 1987 · 55 · 25310.1080/13642818708211207 ↗
5. Taft · J. Electrochem. Soc. · 1984 · 131 · 246010.1149/1.2115321 ↗
6. Irene · Phil. Mag. B · 1987 · 55 · 13110.1080/13642818708211200 ↗
7. Hoff · Appl. Phys. Letters · 1988 · 52 · 126410.1063/1.99676 ↗
8. Ong · J. Opt. Soc. Am. B · 1986 · 3 · 81210.1364/JOSAB.3.000812 ↗
9. Berti · Phys. Rev. B · 1986 · 34 · 234610.1103/PhysRevB.34.2346 ↗
10. Foulon · Appl. Phys. A · 1988 · 45 · 36110.1007/BF00617943 ↗
11. Advanced Lithography