In-process control of silicide formation during rapid thermal processing

journal article·1993-01

J.-M. Dilhac, C. Ganibal, N. Nolhier, P.B. Moynagh, C.P. Chew, P.J. Rosser

Applied Surface Science· Volume 63· Issue 1-4

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Abstract

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OpenAlex topics: Silicon and Solar Cell Technologies · Advanced Surface Polishing Techniques · Laser Material Processing Techniques

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Show source-provided references

1. Moslehi · IEEE Trans. Electron Devices ED-39 · 1992 · 410.1109/16.108208 ↗

2. F. Roozeboom, Rapid Thermal Processing Science and Technology, Ed. R.B. Fair (Academic Press, New York), to be published.

3. Dilhac · 1990 · 90 · 65

4. Dilhac · Appl. Phys. Lett. · 1989 · 55 · 222510.1063/1.102068 ↗

5. Dilhac · Appl. Surf. Sci. · 1990 · 46 · 45110.1016/0169-4332(90)90188-6 ↗

6. Tabasky · IEEE Trans. Electron Devices ED-34 · 1987 · 54810.1109/T-ED.1987.22962 ↗

7. Dilhac · IEEE Trans. Electron Devices ED-39 · 1992 · 20110.1109/16.108231 ↗

8. Dilhac · 1992