journal article·1995-10

The ohmic contact to the silicon Schottky barrier using vanadium silicide and gold or silver metallization

A.D. Remenyuk, N.M. Schmidt

Applied Surface Science· Volume 91· Issue 1-4
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Silicon and Solar Cell Technologies · Integrated Circuits and Semiconductor Failure Analysis

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References (6)

Show source-provided references
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2. L.S. Berman, A.D. Remenyuk and M.G. Tolstobrov, Preprint No. 947 (Ioffe Physical Technical Institute, Academy of Sciences of the USSR, Leningrad, 1985
3. Morgan · Surf. Sci. · 1988 · 204 · 42810.1016/0039-6028(88)90224-5 ↗
4. Clabes · Phys. Rev. B · 1984 · 29 · 154010.1103/PhysRevB.29.1540 ↗
5. Clabes · J. Vac. Sci. Technol. · 1981 · 19 · 26210.1116/1.571117 ↗
6. Clabes · J. Vac. Sci. Technol. · 1982 · 20 · 68410.1116/1.571628 ↗