Determination of ion beam etching damage on InP by spectroscopic ellipsometry
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Optical Coatings and Gratings · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (7)
Show source-provided references
1. Proc. Int. Conf. on Solid State Devices and Materials
2. Dinges · Surf. Interf. Anal. · 1990 · 16 · 7710.1002/sia.740160118 ↗
3. Burkhard · J. Appl. Phys. · 1982 · 53 · 65510.1063/1.329973 ↗
4. Dinges · PTB-Opt-15 · 1983 · 190
5. Dinges · J. Phys. Colloq. C · 1983 · 10 · 39
6. Aspnes · Phys. Rev. B · 1983 · 27 · 98510.1103/PhysRevB.27.985 ↗
7. Palik · 1985