Holographic lithography of a two-dimensional hexagonal structure: Effect of beam polarization

Abstract A comparison is made between the theoretical determination of the interference contrast function with fabricated two-dimensional hexagonal structures of submicron lattice constant. Experiments were performed using a siloxane based hybrid organic–inorganic material and a holographic lithography method. Thin hybrid structured layers were fabricated and characterized for different conditions of beam polarizations between 0 ° and 90 ° . As a result, the photo patterning appears to be strongly dependent on beam polarization in accordance with theoretical predictions.