journal article·1988-10

A model for the kinetics of constant current plasma anodization process

R.B. Beck

Applied Surface Science· Volume 35· Issue 1
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Anodic Oxide Films and Nanostructures · Semiconductor materials and devices · Advanced Surface Polishing Techniques

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References (13)

Show source-provided references
1. Beck · Thin Solid Films · 1980 · 67 · 26110.1016/0040-6090(80)90458-7 ↗
2. Koshiga · Thin Solid Films · 1979 · 56 · 3910.1016/0040-6090(79)90050-6 ↗
3. Kiermasz · Solid State Electron. · 1983 · 26 · 116710.1016/0038-1101(83)90144-2 ↗
4. Nicol · Proc. IEEE · 1968 · 56 · 10910.1109/PROC.1968.6178 ↗
5. Fromhold · Thin Solid Films · 1982 · 95 · 29710.1016/0040-6090(82)90035-9 ↗
6. Fromhold · J. Appl. Phys. · 1980 · 51 · 637710.1063/1.327627 ↗
7. Rosechner · Appl. Phys. Letters · 1979 · 34 · 25410.1063/1.90771 ↗
8. Antula · J. Appl. Phys. · 1972 · 43 · 466310.1063/1.1660985 ↗
9. Matsumura · Mem. Fac. Eng. Osaka City Univ. · 1976 · 17 · 69
10. Beck · 1982
11. Hamasaki · Solid State Electron · 1982 · 25 · 47910.1016/0038-1101(82)90160-5 ↗
12. Beck · 1985 · 387
13. Seiwatz · J. Appl. Phys. · 1958 · 29 · 103410.1063/1.1723358 ↗