journal article·1994-12

Sub-atomic-layer epitaxy of Si using Si2H6

Yoshiyuki Suda, Masahiro Ishida, Mitsutomi Yamashita, Hiroaki Ikeda

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis

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References (11)

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9. Suda · 1994
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11. Laser-Beam Interactions with Materials