Plasma nitrided oxide films as a thin gate dielectric
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Semiconductor materials and devices · Advancements in Semiconductor Devices and Circuit Design · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (10)
Show source-provided references
1. Kato · J. Electron. Mater. · 1984 · 13 · 91310.1007/BF02655307 ↗
2. Wong · J. Electrochem. Soc. · 1983 · 130 · 113910.1149/1.2119904 ↗
3. Moslehi · IEEE Trans. Electron Devices · 1985 · ED-32 · 10610.1109/T-ED.1985.21920 ↗
4. Nulman · Appl. Phys. Letters · 1985 · 47 · 14810.1063/1.96244 ↗
5. Kuiper · J. Appl. Phys. · 1986 · 59 · 276510.1063/1.336985 ↗
6. Proc. Intern. Conf. INFOS83
7. Réactivité dans les Plasmas, Summer School
8. Electrochem. Soc. Meeting
9. Perriere · J. Appl. Phys. · 1986 · 59 · 275210.1063/1.336984 ↗
10. Thin Solid Films, ICTF7