journal article·1998-01

Surface passivation of GaAs with ultrathin Si3N4/Si interface control layer formed by MBE and in situ ECR plasma nitridation

Tamotsu Hashizume, Kengo Ikeya, Morimichi Mutoh, Hideki Hasegawa

Applied Surface Science· Volume 123-124
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Abstract

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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor Quantum Structures and Devices · Semiconductor materials and devices

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References (11)

Show source-provided references
1. Hasegawa · Jpn. J. Appl. Phys. · 1988 · 27 · L226510.1143/JJAP.27.L2265 ↗
2. Kodama · Jpn. J. Appl. Phys. · 1995 · 34 · 114310.1143/JJAP.34.1143 ↗
3. Hasegawa · J. Vac. Sci. Technol. B · 1989 · 7 · 87010.1116/1.584616 ↗
4. Mui · Appl. Phys. Lett. · 1992 · 60 · 251110.1063/1.106950 ↗
5. Van de Walle · Phys. Rev. · 1989 · 39 · 187110.1103/PhysRevB.39.1871 ↗
6. Friedel · J. Vac. Sci. Technol. B · 1987 · 5 · 112910.1116/1.583741 ↗
7. DeLouise · J. Vac. Sci. Technol. A · 1992 · 10 · 163710.1116/1.577762 ↗
8. Zhu · J. Vac. Sci. Technol. A · 1993 · 11 · 83810.1116/1.578314 ↗
9. Bozso · Phys. Rev. B · 1988 · 38 · 393710.1103/PhysRevB.38.3937 ↗
10. Pashley · Phys. Rev. Lett. · 1991 · 67 · 269710.1103/PhysRevLett.67.2697 ↗
11. Ishikawa · J. Vac. Sci. Technol. B · 1997 · 15 · 116310.1116/1.589433 ↗