Interface reactions between CVD and PVD tungsten and aluminium
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OpenAlex topics: Semiconductor materials and interfaces · Semiconductor materials and devices · Copper Interconnects and Reliability
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References (9)
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2. Kang · J. Electron. Mater. · 1988 · 17 · 21310.1007/BF02652180 ↗
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5. Wang · Thin Solid Films · 1992 · 207 · 3710.1016/0040-6090(92)90098-V ↗
6. Gutierrez · 1988 · III · 271
7. Pauleau · 1988 · III · 275
8. Mitwalsky · J. Electrochem. Soc. · 1991 · 138 · 1010.1149/1.2085359 ↗
9. Mitwalsky · J. Electrochem. Soc. · 1991 · 138 · 302510.1149/1.2085359 ↗