Fabrication of ultrathin silicon dioxide layers in room temperature by ultrahigh vacuum plasma oxidation
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OpenAlex topics: Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence · Electronic and Structural Properties of Oxides
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References (9)
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8. Depas · IEEE Trans. Electron Devices · 1996 · 43 · 149910.1109/16.535341 ↗
9. Lenzlinger · J. Appl. Phys. · 1969 · 40 · 27810.1063/1.1657043 ↗