journal article·1991-01

Ion beam modification of the dielectric properties of thin silicon dioxide films

S. Kar, A. Raychaudhuri, A.K. Sinha, S. Ashok

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and devices · Ion-surface interactions and analysis

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References (6)

Show source-provided references
1. Stagg · Appl. Phys. Lett. · 1977 · 31 · 53210.1063/1.89766 ↗
2. Pepper · Phys. Status Solidi · 1972 · 12 · 19910.1002/pssa.2210120121 ↗
3. Nemeth-Sallary · Thin Solid Films · 1980 · 70 · 3710.1016/0040-6090(80)90409-5 ↗
4. Offenburg · Appl. Surf. Sci. · 1987 · 30 · 26510.1016/0169-4332(87)90101-2 ↗
5. Ziegler · 1985
6. Fahrner · Phys. Status Solidi · 1986 · 95 · 34310.1002/pssa.2210950143 ↗