journal article·1991-11

Chemical vapour deposition of tungsten by H2 reduction of WC16

J.A.M. Ammerlaan, D.R.M. Boogaard, P.J. van der Put, J. Schoonman

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advanced materials and composites · Metal and Thin Film Mechanics · Semiconductor materials and devices

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References (14)

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