journal article·1992-01

Rapid thermal chemical vapour deposition of SiOxNy films

F. Lebland, C. Licoppe, Y. Gao, Y.I. Nissim, S. Rigo

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies

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References (3)

Show source-provided references
1. Morosanu · Thin Solid Films · 1980 · 65 · A110.1016/0040-6090(80)90254-0 ↗
2. Nissim · Proc. SPIE · 1988 · 1033 · 27310.1117/12.950629 ↗
3. Nissim · Appl. Surf. Sci. · 1990 · 46 · 17510.1016/0169-4332(90)90139-Q ↗