journal article·1998-05

Effects of background gas–plume interaction in the deposition of SiNx films

E.C. Samano, R. Machorro, G. Soto, L. Cota-Araiza

Applied Surface Science· Volume 127-129
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (11)

Show source-provided references
1. Assadulayev · J. Appl. Phys. · 1987 · 61 · 456610.1063/1.338959 ↗
2. Maeda · J. Appl. Phys. · 1991 · 70 · 274510.1063/1.350352 ↗
3. D.B. Geohegan, in: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, Chap. 5.
4. Fogarassy · J. Appl. Phys. · 1994 · 76 · 261210.1063/1.357557 ↗
5. Inukai · Jpn. J. Appl. Phys. · 1993 · 33 · 259310.1143/JJAP.33.2593 ↗
6. Venkatesan · Appl. Phys. Lett. · 1988 · 52 · 119310.1063/1.99673 ↗
7. Gonzalo · Appl. Surf. Sci. · 1996 · 96–98 · 69310.1016/0169-4332(95)00546-3 ↗
8. Theeten · Annu. Rev. Mater. Sci. · 1981 · 11 · 9710.1146/annurev.ms.11.080181.000525 ↗
9. Aspnes · Thin Solid Films · 1982 · 89 · 24910.1016/0040-6090(82)90590-9 ↗
10. W.H. Press, W.T. Vetterling, S.A. Teukolsky, B.P. Flannery, Numerical Recipies in C, 2nd ed., Cambridge Univ. Press, Cambridge, 1992, p. 683.
11. R.A. Smith, Semiconductors, Cambridge Univ. Press, Cambridge, 1978, p. 495.