journal article·1997-02

Dependence of the thickness profile of pulsed laser deposited bismuth films on process parameters

T Szörényi, J.M Ballesteros

Applied Surface Science· Volume 109-110
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Abstract

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Research context

OpenAlex topics: nanoparticles nucleation surface interactions · Advanced Chemical Physics Studies · Spectroscopy and Laser Applications

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References (8)

Show source-provided references
1. K.L. Saenger, in: Pulsed Laser Deposition of Thin Films, Eds. D.B. Chrisey and G.K. Hubler (Wiley, New York, 1994) p. 199.
2. J. Perriere, in: Laser Ablation of Electronic Materials, Eds. E. Fogarassy and S. Lazare (Elsevier, Amsterdam, 1992) p. 293.
3. J. Gonzalo, C.N. Afonso, F. Vega, D. Martinez Garcia and J. Perriere, Appl. Surf. Sci. 86 (1995) 40.10.1016/0169-4332(94)00365-3 ↗
4. J.C.G. de Sande, T. Missana and C.N. Afonso, J. Appl. Phys., in press.
5. C. Fuchs and E. Fogarassy, Mater. Res. Symp. Proc. 169 (1989) 517.10.1557/PROC-169-517 ↗
6. J.C.S. Kools, T.S. Baller, S.T. De Zwart and J. Dieleman, J. Appl. Phys. 71 (1992) 4547.10.1063/1.350772 ↗
7. D.J. Lichtenwalner, O. Auciello, R. Dat and A.I. Kingon, J. Appl. Phys. 74 (1993) 7497.10.1063/1.354974 ↗
8. J.W. McCamy, D.H. Lowndes, J.D. Budai, R.A. Zuhr and X. Zhang, J. Appl. Phys. 73 (1993) 7818.10.1063/1.353956 ↗