Effects of post-oxidation annealing on 3nm-thick low-temperature-grown gate oxide
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OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Semiconductor materials and interfaces
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References (7)
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6. Wang · IEEE Trans. Electron Devices · 1994 · ED-41 · 247510.1109/16.337468 ↗
7. White · IEEE Trans. Electron Devices · 1972 · ED-19 · 128010.1109/T-ED.1972.17591 ↗