journal article·1990-12

Filling of Si oxide into a deep trench using digital CVD method

Y. Horiike, T. Ichihara, H. Sakaue

Applied Surface Science· Volume 46· Issue 1-4
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and devices · Plasma Diagnostics and Applications · Thin-Film Transistor Technologies

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References (7)

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3. Extended Abstr. 21th Conf. on Solid State Devices and Materials
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5. 1975 · 13
6. 1975 · 374
7. Noguchi · 1987 · 451