Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation
Source abstract
Abstract
Abstract This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential −2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several μm) of aluminium dopants with concentration in the range of (12–35) at% can be formed.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced materials and composites · Vacuum and Plasma Arcs · Metal and Thin Film Mechanics
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References (15)
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