Effect of pH on film structure and electrical property of PMMA–Au composite particles prepared by redox transmetalation
Source abstract
Abstract
Abstract Surface-selective deposition of gold (Au) on electroless plated poly(methyl methacrylate)–nickel (PMMA–Ni) beads was prepared chemically by a facile redox-transmetalation route in which the Ni atoms on the PMMA surface were reacted with Au precursors, i.e., chloroauric acid (HAuCl 4 ), in water to form predominately core-shell PMMA–Au composite particles without the need of reducing agent. The Ni layer acted as a sacrificial template to facilitate the selective transmetalation deposition of a metallic Au film. When pH of the precursor solution was adjusted from 6 to 9, morphology of the Au film changed from a uniform particulate film consisting of assemblies of Au nanoparticles, to densely packed, continuous film with platelet Au crystals, and finally to isolated Au islands on the PMMA surface with a raspberry-like core–shell morphology. Uniformly dense Au coating with a thickness of about 200 nm was formed on the PMMA beads at pH of 7 to 8, which gave rise to an electrical resistivity as low as 3 × 10 −2 Ω cm.
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Research context
OpenAlex topics: Catalytic Processes in Materials Science · Nanomaterials and Printing Technologies · Gas Sensing Nanomaterials and Sensors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (35)
Show source-provided references
1. Chaudhuri · Chem. Rev. · 2012 · 112 · 237310.1021/cr100449n ↗
2. Agrawal · J. Mater. Chem. · 2011 · 21 · 61510.1039/C0JM02631J ↗
3. Caruso · Adv. Mater. · 2001 · 13 · 1110.1002/1521-4095(200101)13:1<11::AID-ADMA11>3.0.CO;2-N ↗
4. Bourgeat-Lami · J. Nanosci. Nanotechnol. · 2010 · 2 · 110.1166/jnn.2002.075 ↗
5. Cozzoli · Chem. Soc. Rev. · 2006 · 35 · 119510.1039/b517790c ↗
6. Ji · Adv. Mater. · 2001 · 13 · 125310.1002/1521-4095(200108)13:16<1253::AID-ADMA1253>3.0.CO;2-T ↗
7. Dong · Chem. Commun. · 2002 · 38 · 35010.1039/b110164c ↗
8. Wang · Colloid Polym. Sci. · 2006 · 284 · 44910.1007/s00396-005-1401-7 ↗
9. Chen · J. Phys. Chem. C · 2007 · 111 · 1182910.1021/jp0711085 ↗
10. Mayer · J. Phys. Chem. B · 2000 · 104 · 727810.1021/jp000568u ↗
11. Jeon · Macromol. Res. · 2009 · 17 · 210.1007/BF03218592 ↗
12. Jiang · Surf. Coat. Technol. · 2007 · 201 · 717410.1016/j.surfcoat.2007.01.031 ↗
13. The electroless deposition of gold
14. Lin · J. Am. Chem. Soc. · 1993 · 115 · 1164410.1021/ja00077a092 ↗
15. Lin · J. Am. Chem. Soc. · 1996 · 118 · 597710.1021/ja944130h ↗
16. Lin · J. Am. Chem. Soc. · 1996 · 118 · 598810.1021/ja944131+ ↗
17. Crane · J. Am. Chem. Soc. · 2000 · 122 · 342210.1021/ja993653s ↗
18. Gu · Chem. Mater. · 1998 · 10 · 214510.1021/cm980031h ↗
19. Gu · Thin Solid Films · 1999 · 340 · 4510.1016/S0040-6090(98)01401-1 ↗
20. Park · J. Am. Chem. Soc. · 2001 · 123 · 574310.1021/ja0156340 ↗
21. Chen · Chem. Mater. · 2007 · 19 · 339910.1021/cm070182x ↗
22. Park · J. Am. Chem. Soc. · 2004 · 126 · 907210.1021/ja049649k ↗
23. Lee · J. Am. Chem. Soc. · 2005 · 127 · 1609010.1021/ja053659j ↗
24. Chen · J. Alloy. Compd. · 2009 · 475 · 49410.1016/j.jallcom.2008.07.115 ↗
25. Sarkar · J. Phys. Chem. C · 2011 · 115 · 165910.1021/jp109572c ↗
26. Mohl · J. Phys. Chem. C · 2010 · 114 · 38910.1021/jp9083508 ↗
27. Sun · J. Am. Chem. Soc. · 2004 · 126 · 939910.1021/ja048789r ↗
28. Au · Adv. Mater. · 2008 · 20 · 251710.1002/adma.200800255 ↗
29. Tokonami · J. Electrochem. Soc. · 2009 · 156 · D55810.1149/1.3240594 ↗
30. Lin · J. Mater. Sci. · 2008 · 43 · 307210.1007/s10853-007-2320-4 ↗
31. Lin · Appl. Surf. Sci. · 2013 · 282 · 74110.1016/j.apsusc.2013.04.175 ↗
32. Skrabalak · Acc. Chem. Res. · 2008 · 41 · 158710.1021/ar800018v ↗
33. Nechayev · Geokhimiya · 1983 · 6 · 919
34. Moreau · J. Catal. · 2005 · 231 · 10510.1016/j.jcat.2005.01.030 ↗
35. Tsai · J. Nanopart. Res. · 2011 · 13 · 685910.1007/s11051-011-0593-7 ↗