Effects of in situ plasma treatment on optical and electrical properties of index-matched transparent conducting oxide layer
Source abstract
Abstract
Abstract We investigated the effects of in situ plasma-treatment on optical and electrical properties of index-matched indium tin oxide (IMITO) thin film. To render the IMITO-coated surface hydrophilic and study the optical and electrical characteristics, we performed in situ oxygen plasma post-treatment without breaking vacuum. The 94.6% transmittance in the visible wavelength range (400–700 nm) increased on average to 96.4% and the maximum transmittance reached 98% over a broad wavelength range. The surface roughness and sheet resistance improved from 0.9 nm and 200 Ω/sq to 0.0905 nm and 100 Ω/sq, respectively, by in situ plasma post-treatment. We confirmed by contact angle measurement that the hydrophobic IMITO surface was altered to hydrophilic. The improved optical and electrical characteristics of in situ plasma-treated IMITO makes it adequate for high-resolution liquid crystal on silicon displays.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Thin-Film Transistor Technologies · Liquid Crystal Research Advancements · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (15)
Show source-provided references
1. Zheng · Appl. Opt. · 1997 · 36 · 633510.1364/AO.36.006335 ↗
2. Rizzo · Proc. SPIE · 1996 · 2776 · 39210.1117/12.246827 ↗
3. Stupp · 1999
4. Chen · Opt. Express · 2009 · 7 · 713010.1364/OE.17.007130 ↗
5. Bogaert · Displays · 2008 · 29 · 110.1016/j.displa.2007.06.006 ↗
6. Chung · 2008 · 3
7. Choi · 2009 · P2
8. Kim · Solid-State Electron. · 2008 · 52 · 110.1016/j.sse.2007.07.037 ↗
9. Jeong · Jpn. J. App. Phys. · 2006 · 45 · 278810.1143/JJAP.45.2788 ↗
10. Macleod · 1986
11. Xiao · Thin Solid Films · 1998 · 334 · 17310.1016/S0040-6090(98)01138-9 ↗
12. Kim · J. Vac. Sci. Technol. A · 2002 · 14 · 324
13. Kim · J. Appl. Phys. · 1999 · 86 · 277410.1063/1.371124 ↗
14. He · Chem. Phys. Lett. · 2003 · 370 · 79510.1016/S0009-2614(03)00177-5 ↗
15. Li · J. Mater. Sci.: Mater. Electron. · 2008 · 19 · 121410.1007/s10854-007-9545-5 ↗