journal article·2010-09

Effects of in situ plasma treatment on optical and electrical properties of index-matched transparent conducting oxide layer

Yong Hwan Lim, Hana Yoo, Bum Ho Choi, Young Baek Kim, Jong Ho Lee, Dong Chan Shin

Applied Surface Science· Volume 256· Issue 23
Publisher page

Abstract

Abstract We investigated the effects of in situ plasma-treatment on optical and electrical properties of index-matched indium tin oxide (IMITO) thin film. To render the IMITO-coated surface hydrophilic and study the optical and electrical characteristics, we performed in situ oxygen plasma post-treatment without breaking vacuum. The 94.6% transmittance in the visible wavelength range (400–700 nm) increased on average to 96.4% and the maximum transmittance reached 98% over a broad wavelength range. The surface roughness and sheet resistance improved from 0.9 nm and 200 Ω/sq to 0.0905 nm and 100 Ω/sq, respectively, by in situ plasma post-treatment. We confirmed by contact angle measurement that the hydrophobic IMITO surface was altered to hydrophilic. The improved optical and electrical characteristics of in situ plasma-treated IMITO makes it adequate for high-resolution liquid crystal on silicon displays.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Liquid Crystal Research Advancements · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (15)

Show source-provided references
1. Zheng · Appl. Opt. · 1997 · 36 · 633510.1364/AO.36.006335 ↗
2. Rizzo · Proc. SPIE · 1996 · 2776 · 39210.1117/12.246827 ↗
3. Stupp · 1999
4. Chen · Opt. Express · 2009 · 7 · 713010.1364/OE.17.007130 ↗
5. Bogaert · Displays · 2008 · 29 · 110.1016/j.displa.2007.06.006 ↗
6. Chung · 2008 · 3
7. Choi · 2009 · P2
8. Kim · Solid-State Electron. · 2008 · 52 · 110.1016/j.sse.2007.07.037 ↗
9. Jeong · Jpn. J. App. Phys. · 2006 · 45 · 278810.1143/JJAP.45.2788 ↗
10. Macleod · 1986
11. Xiao · Thin Solid Films · 1998 · 334 · 17310.1016/S0040-6090(98)01138-9 ↗
12. Kim · J. Vac. Sci. Technol. A · 2002 · 14 · 324
13. Kim · J. Appl. Phys. · 1999 · 86 · 277410.1063/1.371124 ↗
14. He · Chem. Phys. Lett. · 2003 · 370 · 79510.1016/S0009-2614(03)00177-5 ↗
15. Li · J. Mater. Sci.: Mater. Electron. · 2008 · 19 · 121410.1007/s10854-007-9545-5 ↗