A new CVD reaction for atomic layer deposition of silicon
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Semiconductor materials and devices · Catalytic Processes in Materials Science · Electron and X-Ray Spectroscopy Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (12)
Show source-provided references
1. 1990
2. Takahashi · Jpn. J. Appl. Phys. · 1991 · 30 · L20910.1143/JJAP.30.L209 ↗
3. Nishizawa · J. Cryst. Growth · 1990 · 99 · 50210.1016/0022-0248(90)90571-2 ↗
4. Lubben · J. Vac. Sci. Technol. A · 1991 · 9 · 300310.1116/1.577164 ↗
5. Yarmoff · J. Vac. Sci. Technol. A · 1992 · 10 · 32410.1116/1.577935 ↗
6. Koleske · Appl. Phys. Lett. · 1992 · 61 · 180210.1063/1.108405 ↗
7. Wozniak · 1993
8. Zegarski · Surf. Sci. · 1992 · 262 · L12910.1016/0039-6028(92)90121-L ↗
9. Lowry · 1987
10. Shimanouchi · 1972 · Vol. I
11. Gordon · 1972 · 202
12. Emsley · 1989