journal article·1990-12

The influence of deposition parameters on the growth of a-SiGe:H alloys in a plasma CVD system

M. Zeman, I. Ferreira, M.J. Geerts, J.W. Metselaar

Applied Surface Science· Volume 46· Issue 1-4
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

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References (6)

Show source-provided references
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3. Muramatsu · Proc. 1988 IEEE Conf. · 1988 · 61
4. Bauer · Mater. Res. Symp. Proc. · 1989 · Vol. 149 · 48510.1557/PROC-149-485 ↗
5. van Oort · Electron. Lett. · 1987 · 23 · 96710.1049/el:19870680 ↗
6. Tanaka · Mater. Res. Symp. Proc. · 1986 · Vol. 70 · 24510.1557/PROC-70-245 ↗