journal article·2010-09

Influence of high-pressure hydrogen treatment on structural and electrical properties of ZnO thin films

Chunye Li, Hongwei Liang, Jianze Zhao, Qiuju Feng, Jiming Bian, Yang liu, Rensheng Shen, Wangcheng Li, Guoguang Wu, G.T. Du

Applied Surface Science· Volume 256· Issue 22
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Abstract

Abstract ZnO thin films were treated by high-pressure hydrogen (H 2 ). Scanning electron microscope (SEM) images show that the surface morphology of ZnO films has been changed significantly by H 2 treatment. X-ray diffraction patterns show that the Zn(OH) 2 phases formed after H 2 treatment. The X-ray photoelectron spectroscopy results indicate that H atoms were doped into the surface of ZnO by forming H–O–Zn bond. The phenomenon shows that it is easy to form O–H bond in ZnO rather than H interstitial atom under high-pressure hydrogen circumstance.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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