Investigation on optical absorption properties of electrochemically formed porous InP using photoelectric conversion devices
Source abstract
Abstract
We investigated the optical absorption properties of InP porous structures formed by the electrochemical process using photoelectric conversion (PC) devices formed on p-n junction substrates. The photocurrent measurements revealed that the current from PC devices changed in response to the incident light power and the thickness of the top layer on the p-n interface. Since the photocarriers contributing to the observed photocurrents are excited by the photons reaching the p-n interface through the top layer, the photocurrents give us information on the optical absorption properties of the top layer. The photocurrents observed on a porous device with a porous structure in the top layer were lower than that of a non-porous device, indicating that the absorption properties of InP were enhanced after the formation of porous structures. This phenomenon can be explained in terms of absorption coefficient, α, increased by the light scattering and the sub-bandgap absorption in the porous layer. (C) 2013 Elsevier B.V. All rights reserved.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Nanowire Synthesis and Applications · Semiconductor materials and interfaces
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (29)
Show source-provided references
1. Hongjie · Applied Surface Science · 2012 · 258 · 545110.1016/j.apsusc.2012.02.033 ↗
2. Uhlir · Bell Labs Technical Journal · 1956 · 35 · 333
3. Schmuki · Journal of the Electrochemical Society · 1996 · 143 · 331610.1149/1.1837204 ↗
4. Oskam · Applied Surface Science · 1997 · 119 · 16010.1016/S0169-4332(97)00184-0 ↗
5. Tiginyanu · Electrochemical and Solid-State Letters · 2007 · 10 · D12710.1149/1.2771076 ↗
6. Takizawa · Japanese Journal of Applied Physics · 1994 · 33 · L64310.1143/JJAP.33.L643 ↗
7. Hamamatsu · Journal of Electroanalytical Chemistry · 1999 · 473 · 22310.1016/S0022-0728(99)00107-2 ↗
8. Fujikura · Japanese Journal of Applied Physics · 2000 · 39 · 461610.1143/JJAP.39.4616 ↗
9. Langa · Applied Physics Letters · 2003 · 82 · 27810.1063/1.1537868 ↗
10. Anedda · Applied Physics Letters · 1995 · 67 · 331610.1063/1.115232 ↗
11. Kuriyama · Physical Review B · 1998 · 58 · 110310.1103/PhysRevB.58.1103 ↗
12. Yam · Thin Solid Films · 2007 · 515 · 346910.1016/j.tsf.2006.10.104 ↗
13. Ramizy · Materials Letters · 2011 · 65 · 6110.1016/j.matlet.2010.09.054 ↗
14. Al-Heussen · Applied Surface Science · 2011 · 257 · 619710.1016/j.apsusc.2011.02.031 ↗
15. Shor · Applied Physics Letters · 1993 · 62 · 283610.1063/1.109226 ↗
16. Boukezzata · Applied Surface Science · 2010 · 256 · 559210.1016/j.apsusc.2010.03.037 ↗
17. Keffous · Applied Surface Science · 2010 · 256 · 562910.1016/j.apsusc.2010.03.029 ↗
18. Hasegawa · Electrochimica Acta · 2005 · 50 · 301510.1016/j.electacta.2004.11.066 ↗
19. Sato · Applied Surface Science · 2006 · 252 · 545710.1016/j.apsusc.2005.12.085 ↗
20. Sato · Thin Solid Films · 2010 · 518 · 439910.1016/j.tsf.2010.02.029 ↗
21. Ramizy · Applied Surface Science · 2011 · 257 · 611210.1016/j.apsusc.2011.02.013 ↗
22. Jinbo · Thin Solid Films · 2012 · 520 · 571010.1016/j.tsf.2012.04.031 ↗
23. Naderi · Applied Surface Science · 2012 · 258 · 643610.1016/j.apsusc.2012.03.056 ↗
24. Butler · Journal of the Electrochemical Society · 1981 · 128 · 71210.1149/1.2127489 ↗
25. Erné · Journal of the Electrochemical Society · 1996 · 143 · 30510.1149/1.1836428 ↗
26. Iranzo Marín · Journal of the Electrochemical Society · 1996 · 143 · 113710.1149/1.1836597 ↗
27. van de Lagemaat · Applied Physics Letters · 1996 · 69 · 224610.1063/1.117142 ↗
28. Santinacci · Electrochimica Acta · 2010 · 56 · 87810.1016/j.electacta.2010.09.031 ↗
29. Etchebery · Journal of Applied Physics · 1982 · 53 · 886710.1063/1.330441 ↗