GaN–a new material for positron moderation

Abstract GaN with its wide bandgap might be of interest as a positron moderation material in much the same way as SiC is. To investigate this, positron beam experiments have been performed to establish the diffusion behaviour and surface branching of positrons implanted with energies varying from 0 to 25 keV into an epitaxially grown layer of semi-insulating GaN on a sapphire substrate. The measured diffusion length of the positrons amounted to 19.3 ± 1.4 nm. The surface branching ratios were as follows: 48% positron emission, 12% positronium formation and 40% trapping at the surface. The positron workfunction was shown to be negative with a value of 2.4 ± 0.3 eV. The materials feasibility for positron moderation and its possible use in field assisted moderation is discussed.