journal article·2006-11

Adsorption behaviors of V2O5 nanowires on binary mixed self-assembled monolayers

Jae Pil Koo, Yong-Kwan Kim, Jeong Sook Ha

Applied Surface Science· Volume 253· Issue 3
Publisher page

Abstract

Abstract The adsorption behaviors of V2O5 nanowires on binary mixed self-assembled monolayers (SAMs) were investigated with variation of the mixing ratio of two differently terminated thiolates on Au. Hydroxyl-covered V2O5 nanowires showed a preferential adsorption on amine (NH2)-terminated thiolates over methyl (CH3)-terminated ones. However, on the binary mixed SAM of NH2- and CH3-terminated thiols, the adsorption behavior did not follow a simple expectation based upon the electrostatic interaction. The total number of adsorbed V2O5 nanowires increased with the mole fraction of NH2-terminated thiolates up to χ N H 2 ∼ 0.5 , then it decreased with further increase of χ N H 2 . The height distribution of adsorbed nanowires showed that the relative portion of the agglomerated wires thicker than 3.5 nm to individual wires thinner than 3.5 nm increased up to χ N H 2 ∼ 0.75 and then it decreased with further increase of χ N H 2 . The dispersion of molecules with polar-functional groups as well as the molecular ordering of mixed SAMs is attributed to such adsorption behaviors of V2O5 nanowires.
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Research context

OpenAlex topics: Molecular Junctions and Nanostructures · Electrocatalysts for Energy Conversion · Quantum Dots Synthesis And Properties

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References (38)

Show source-provided references
1. Crooks · Acc. Chem. Res. · 1998 · 31 · 21910.1021/ar970246h ↗
2. Fink · Adv. Mater. · 2000 · 12 · 131510.1002/1521-4095(200009)12:18<1315::AID-ADMA1315>3.0.CO;2-K ↗
3. Willner · Angew. Chem. Int. Ed. · 2000 · 39 · 118010.1002/(SICI)1521-3773(20000403)39:7<1180::AID-ANIE1180>3.0.CO;2-E ↗
4. Tour · Acc. Chem. Res. · 2000 · 33 · 79110.1021/ar0000612 ↗
5. Joachim · Nature · 2000 · 408 · 54110.1038/35046000 ↗
6. Reed · Proc. IEEE · 1999 · 87 · 65210.1109/5.752520 ↗
7. Pease · Acc. Chem. Res. · 2001 · 34 · 43310.1021/ar000178q ↗
8. Fan · J. Am. Chem. Soc. · 2001 · 123 · 245410.1021/ja005819r ↗
9. Kumar · Acc. Chem. Res. · 1995 · 28 · 21910.1021/ar00053a003 ↗
10. Wilbur · Nanotechnology · 1996 · 7 · 45210.1088/0957-4484/7/4/028 ↗
11. Hidber · Langmuir · 1996 · 12 · 137510.1021/la9507500 ↗
12. Younan · Angew. Chem. Int. Ed. · 1998 · 37 · 55010.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G ↗
13. Love · Chem. Rev. · 2005 · 105 · 110310.1021/cr0300789 ↗
14. Wang · Langmuir · 2004 · 20 · 187710.1021/la035376f ↗
15. Mulder · Langmuir · 2001 · 17 · 327310.1021/la001283b ↗
16. Bain · Angew. Chem. Int. Ed. Engl. · 1989 · 28 · 50610.1002/anie.198905061 ↗
17. Michael · Langmuir · 2003 · 19 · 803310.1021/la034810a ↗
18. Wang · Langmuir · 2004 · 20 · 775310.1021/la049849+ ↗
19. Wallwork · Langmuir · 2001 · 17 · 112610.1021/la000870u ↗
20. Li · Langmuir · 2003 · 19 · 297410.1021/la0262957 ↗
21. Li · Langmuir · 2003 · 19 · 326610.1021/la026323l ↗
22. Wang · Langmuir · 2005 · 21 · 263310.1021/la046810w ↗
23. Muster · Adv. Mater. · 2000 · 12 · 42010.1002/(SICI)1521-4095(200003)12:6<420::AID-ADMA420>3.0.CO;2-7 ↗
24. Kim · Appl. Phys. Lett. · 2000 · 76 · 187510.1063/1.126197 ↗
25. Fuhrer · Science · 2000 · 288 · 49410.1126/science.288.5465.494 ↗
26. Fennimore · Nature · 2003 · 424 · 40810.1038/nature01823 ↗
27. Rao · Nature · 2003 · 425 · 3610.1038/425036a ↗
28. Mendes · Langmuir · 2004 · 20 · 376610.1021/la049803g ↗
29. Tenne · Top. Appl. Phys. · 2001 · 80 · 8110.1007/3-540-39947-X_5 ↗
30. Livage · Chem. Mater. · 1991 · 3 · 57810.1021/cm00016a006 ↗
31. Bullot · Appl. Phys. Lett. · 1980 · 36 · 98610.1063/1.91392 ↗
32. Kim · Appl. Phys. Lett. · 2001 · 79 · 349710.1063/1.1419054 ↗
33. Gu · Nat. Mater. · 2003 · 2 · 31610.1038/nmat880 ↗
34. Kim · Thin Solid Films · 2005 · 479 · 27710.1016/j.tsf.2004.11.199 ↗
35. Kim · Appl. Surf. Sci. · 2005 · 249 · 710.1016/j.apsusc.2004.11.077 ↗
36. Park · Chem. Phys. Lett. · 2004 · 390 · 19910.1016/j.cplett.2004.04.024 ↗
37. Chen · Langmuir · 2000 · 16 · 928710.1021/la000417i ↗
38. Kakiuchi · Langmuir · 2000 · 16 · 723810.1021/la991590l ↗