Micro-scale patterning of indium tin oxide film by spatially modulated pulsed Nd:YAG laser beam
Source abstract
Abstract
Abstract Here we demonstrate that indium tin oxide (ITO) films deposited on glass can be directly patterned by a spatially -modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident onto the film. This method utilizes a pulsed laser-induced thermo-elastic force exerting on the film which plays a role to detach it from the substrate. Sharp-edged clean patterns with feature size as small as 4 μm could be obtained. The threshold pulse energy density for patterning was estimated to be ∼0.8 J/cm 2 for 150 nm-thick ITO film, making it possible to pattern over one square centimeter by a single pulse with energy of 850 mJ. Not only being free from photoresist and chemical etching steps, the presented method can also provide much higher throughput than the tradition photoablation process utilizing a tightly focused beam.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Laser Material Processing Techniques · Thin-Film Transistor Technologies · Surface Roughness and Optical Measurements
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (26)
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