Determination of layer thickness with μXRF
Source abstract
Abstract
Abstract The significance of thin films in modern high tech applications requires fast and nondestructive analysis. A method to determine the thickness of single layers with μXRF via a calibration procedure is described. The influences of surface roughness and the angle of the incident beam on the intensity of the fluorescence radiation are discussed.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: X-ray Spectroscopy and Fluorescence Analysis · Electron and X-Ray Spectroscopy Techniques · Cultural Heritage Materials Analysis
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References (6)
Show source-provided references
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