journal article·2008-08

First-principles calculations of ethanethiol adsorption and decomposition on GaN (0001) surface

Chun-Li Hu, Yong Chen, Jun-Qian Li, Yong-Fan Zhang

Applied Surface Science· Volume 254· Issue 20
Publisher page

Abstract

Abstract The adsorption and decomposition of ethanethiol on GaN (0 0 0 1) surface have been investigated with first-principles calculations. The DFT calculations reveal that ethanethiol adsorbs dissociatively on the clean GaN (0 0 0 1) surface to form ethanethiolate and hydrogen species. An up limit coverage of 0.33 for ethanethiolate monolayer on GaN (0 0 0 1) surface is obtained and the position of the sulfur atom and the tilt angle of the thiolate chain are found to be very sensitive to the surface coverage. Furthermore, the reactivity of ethanethiol adsorption and further thermal decomposition reactions on GaN (0 0 0 1) surface is discussed by calculating the possible reaction pathways and ethene is found to be the major product.
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Research context

OpenAlex topics: Molecular Junctions and Nanostructures · GaN-based semiconductor devices and materials · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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