Room temperature weak ferromagnetism and magnetoconductance in functional CuO film
Source abstract
Abstract
Abstract The granular CuO films are deposited on n-Si (1 0 0) and sapphire substrates using sol–gel route. Small microstrain leads to ∼5 times larger grain sizes (200–300 nm) and ∼2.5 times larger film thickness (∼0.57 μm) for sapphire than n-Si substrate, which are confirmed by X-ray diffraction and Atomic Force Microscopy. A diode-like current–voltage characteristics are observed for film deposited on n-Si substrate, which is absent for sapphire substrate. Typical manifestation of ferromagnetic character is observed for CuO films, which are strongly influenced by the substrates. Magnetic anisotropy is larger for sapphire substrate than n-Si substrate. At room temperature considerably large magnetoconductance ∼21% and soft ferromagnetic character of CuO film on n-Si substrate are attractive for functional applications.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Electronic and Structural Properties of Oxides
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (37)
Show source-provided references
1. Ohno · Science · 1998 · 281 · 95110.1126/science.281.5379.951 ↗
2. Macdonald · Nat. Mater. · 2005 · 4 · 19510.1038/nmat1325 ↗
3. Pearton · J. Appl. Phys. · 2003 · 93 · 110.1063/1.1517164 ↗
4. Matthias · Phys. Rev. Lett. · 1961 · 7 · 16010.1103/PhysRevLett.7.160 ↗
5. Baltzer · Phys. Rev. Lett. · 1965 · 15 · 49310.1103/PhysRevLett.15.493 ↗
6. Dietl · Science · 2000 · 287 · 101910.1126/science.287.5455.1019 ↗
7. Janisch · J. Phys. Condens. Matter · 2005 · 17 · R65710.1088/0953-8984/17/27/R01 ↗
8. Ogale · Adv. Mater. · 2010 · 22 · 312510.1002/adma.200903891 ↗
9. Wang · Appl. Phys. Lett. · 2005 · 87 · 20250110.1063/1.2130532 ↗
10. Lin · Appl. Phys. Lett. · 2006 · 89 · 20250110.1063/1.2388130 ↗
11. Lin · Appl. Phys. Lett. · 2006 · 89 · 20250110.1063/1.2388130 ↗
12. Yan · Appl. Phys. Lett. · 2008 · 92 · 05250810.1063/1.2841819 ↗
13. Terakura · Phys. Rev. Lett. · 1984 · 52 · 183010.1103/PhysRevLett.52.1830 ↗
14. Mckay · Phys. Rev. Lett. · 1984 · 53 · 234310.1103/PhysRevLett.53.2343 ↗
15. Lewis · J. Phys. C: Solid State Phys. · 1973 · 6 · 252510.1088/0022-3719/6/15/012 ↗
16. Yang · Phys. Rev. B · 1988 · 38 · 17410.1103/PhysRevB.38.174 ↗
17. Li · J. Appl. Phys. · 2010 · 107 · 11390810.1063/1.3436573 ↗
18. Zhao · J. Phys. Condens. Matter · 2008 · 20 · 42520810.1088/0953-8984/20/42/425208 ↗
19. Filippetti · Phys. Rev. B · 2006 · 7410.1103/PhysRevB.74.220401 ↗
20. Yang · Appl. Phys. Lett. · 2003 · 83 · 374610.1063/1.1623944 ↗
21. Punnoose · Phys. Rev. B · 2001 · 64 · 17442010.1103/PhysRevB.64.174420 ↗
22. Punnoose · J. Appl. Phys. · 2002 · 91 · 776610.1063/1.1447182 ↗
23. Zheng · Solid State Commun. · 2004 · 132 · 49310.1016/j.ssc.2004.06.037 ↗
24. Rao · J. Appl. Phys. · 2009 · 105 · 09390110.1063/1.3079801 ↗
25. Xiao · Solid State Commun. · 2007 · 141 · 43110.1016/j.ssc.2006.12.005 ↗
26. Horcas · Rev. Sci. Instrum. · 2007 · 78 · 01370510.1063/1.2432410 ↗
27. Ghosh · J. Appl. Phys. · 2004 · 96 · 268910.1063/1.1769598 ↗
28. Williamson · Acta Metall. · 1953 · 1 · 2210.1016/0001-6160(53)90006-6 ↗
29. Maji · J. Solid State Chem. · 2010 · 183 · 190010.1016/j.jssc.2010.06.007 ↗
30. Das · J. Phys. Chem. C · 2010 · 114 · 667110.1021/jp100947r ↗
31. Dietl · Nat. Mater. · 2010 · 9 · 96510.1038/nmat2898 ↗
32. Livingston · J. Appl. Phys. · 1981 · 52 · 254410.1063/1.328996 ↗
33. Morrish · 1965
34. J. Phys10.1088/0953-8984/18/39/035 ↗
35. Thakur · Nanotechnology · 2008 · 19 · 04570610.1088/0957-4484/19/04/045706 ↗
36. Sundaresan · Nano Today · 2009 · 4 · 9610.1016/j.nantod.2008.10.002 ↗
37. J. Phys10.1088/0953-8984/23/7/073201 ↗