Sputtering of Cu in a high pressure atmosphere
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Ion-surface interactions and analysis · Copper Interconnects and Reliability
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References (9)
Show source-provided references
1. Harper · J. Vacuum Sci. Technol. · 1982 · 21 · 73710.1116/1.571820 ↗
2. Cuomo · J. Vacuum Sci. Technol. · 1978 · 15 · 28110.1116/1.569571 ↗
3. Thornton · Thin Solid Films · 1977 · 40 · 33510.1016/0040-6090(77)90135-3 ↗
4. Weissmantel · Thin Solid Films · 1981 · 80 · 1310.1016/0040-6090(81)90202-9 ↗
5. Huang · J. Vacuum Sci. Technol. A · 1985 · 3 · 216110.1116/1.573271 ↗
6. Takagi · Thin Solid Films · 1982 · 92 · 110.1016/0040-6090(82)90183-3 ↗
7. Ishii · Japan. J. Appl. Phys. · 1987 · 26 · L93210.1143/JJAP.26.L932 ↗
8. Somekh · J. Vacuum Sci. Technol. A · 1984 · 2 · 128510.1116/1.572396 ↗
9. Motohiro · J. Vacuum Sci. Technol. A · 1986 · 4 · 18910.1116/1.573469 ↗