Spray pyrolysis deposition of YSZ and YSZ–Pt composite films
Source abstract
Abstract
Abstract In the present paper procedures are described for spray pyrolysis deposition of YSZ films (0.1–30 μm in thickness) with 8 or 15 mole % of YO 1.5 on different substrates. Aqueous or ethylene glycol solutions of Y–Zr-citrates were used as starting material and O 2 as carrier gas. The crystal structure and the morphology of the films were studied. The optimal deposition and post-deposition annealing conditions were defined, taking into account the desired film thickness and characteristics. Substrate temperatures of 250 °C during the deposition followed by heating for 10 min to 400 °C after every spraying and to 590 °C after every three sprayings with final annealing at 590 °C for 2 h in static air atmosphere were found to be suitable for the production of dense, uniform and cracks-free films.
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Research context
OpenAlex topics: Electronic and Structural Properties of Oxides · Semiconductor materials and devices · ZnO doping and properties
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