Epitaxial superlattices grown by a PLD-based continuous compositional-spread technique
Source abstract
Abstract
Abstract A recently introduced continuous compositional-spread (CCS) technique-based on the non-uniformity of the deposition rate typically observed in pulsed laser deposition (PLD) is applied to the growth of epitaxial superlattices. This PLD–CCS method uses rapid (sub-monolayer) sequential deposition of the phase spread’s constituents, whereby a pseudo-binary or pseudo-ternary phase diagram can be deposited without the need for masks or a post-anneal. Consequently, combinatorial materials synthesis can be carried out under optimized film growth conditions (e.g., complex oxides can be grown at high-temperatures). Most importantly, lifting the requirement of a post-anneal to promote interdiffusion and crystallization renders this method applicable to the growth of epitaxial heterostructures. Results are shown for the case of superlattices consisting of a repeated stacking of SrTiO 3 and (Sr x Ba 1− x )ZrO 3 layers, where the parameter x varies continuously across the sample. Because all of these samples are obtained in one single deposition, and because the approach is easily generalized to pseudo-ternary systems, the PLD–CCS method results in significant timesavings for studies of epitaxial superlattices.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Electronic and Structural Properties of Oxides · Ferroelectric and Piezoelectric Materials · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (15)
Show source-provided references
1. Xiang · Science · 1995 · 268 · 173810.1126/science.268.5218.1738 ↗
2. Briceno · Science · 1995 · 270 · 27310.1126/science.270.5234.273 ↗
3. Wang · Science · 1998 · 279 · 171210.1126/science.279.5357.1712 ↗
4. Chang · Appl. Phys. Lett. · 1998 · 72 · 218510.1063/1.121316 ↗
5. Masumoto · Jpn. J. Appl. Phys. · 1999 · 38 · L60310.1143/JJAP.38.L603 ↗
6. Jin · J. Cryst. Growth · 2000 · 214–215 · 5510.1016/S0022-0248(00)00058-0 ↗
7. Koinuma · Appl. Phys. A · 1999 · 69 · S2910.1007/s003399900362 ↗
8. Christen · Thin Solid Films · 1998 · 312 · 15610.1016/S0040-6090(97)00736-0 ↗
9. Funakoshi · Jpn. J. Appl. Phys. · 1994 · 33 · 526210.1143/JJAP.33.5262 ↗
10. Hanak · J. Mater. Sci. · 1970 · 5 · 96410.1007/BF00558177 ↗
11. van Dover · Nature · 1998 · 392 · 16210.1038/32381 ↗
12. van Dover · Appl. Phys. Lett. · 1999 · 74 · 304110.1063/1.124058 ↗
13. Schneemeyer · Appl. Phys. Lett. · 1999 · 75 · 196710.1063/1.124887 ↗
14. H.M. Christen, S.D. Silliman, K.S. Harshavardhan, Rev. Sci. Instrum. 72 (2001) 2673.10.1063/1.1374597 ↗
15. Christen · Appl. Phys. Lett. · 1997 · 70 · 214710.1063/1.119082 ↗