journal article·2002-06

Surface roughness influence on photothermal radiometry

H.G. Walther

Applied Surface Science· Volume 193· Issue 1-4
Publisher page

Abstract

Frequency scanned radiometric measurements from rough absorbers are different from smooth samples. This effect has to be considered for accurate data interpretation, for instance, for photothermal depth profiling. Based on the equivalent layer model we discussed the effect of roughness induced thermal wave dispersion and derived a formula which correctly describes the observed experimental features: (i) appearance of phase difference extremum; (ii) rise of the relative signal magnitude at increased frequencies. The validity of the theory was successfully demonstrated by comparing calculations with radiometric measurements from rough steel samples.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thermography and Photoacoustic Techniques · Cultural Heritage Materials Analysis · Laser-induced spectroscopy and plasma

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (13)

Show source-provided references
1. Walther · Anal. Sci. · 2001 · 17 · 428
2. Nicolaides · Anal. Sci. · 2001 · 17 · 383
3. Kiepert · Prog. Nat. Sci. · 1996 · 6 · 317
4. Walther · J. Appl. Phys. · 2001 · 89 · 293910.1063/1.1340596 ↗
5. Vandembroucq · Prog. Nat. Sci. · 1996 · 6 · 313
6. Osiander · Prog. Nat. Sci. · 1996 · 6 · 653
7. Vandembroucq · Phys. Rev. E · 1997 · 55 · 617110.1103/PhysRevE.55.6171 ↗
8. ISO 4287, Surface texture: profile method—terms, definition and texture parameters, 1997.
9. G. Busse, H.G. Walther, in: A. Mandelis (Ed.), Progress in Photothermal and Photoacoustic Sciences and Technology, Vol. 1, Elsevier, Amsterdam, 1992, pp. 205–298.
10. Schmittbuhl · Phys. Rev. E · 1995 · 51 · 13110.1103/PhysRevE.51.131 ↗
11. Aamodt · J. Appl. Phys. · 1982 · 52 · 111
12. Optisches Tastschnittgerät, Evaluation by Taylor–Hobson Method, Hommelwerke, Germany.
13. Lan · J. Appl. Phys. · 1995 · 78 · 410810.1063/1.359869 ↗