The advantages of normal incidence ultra-low energy secondary ion mass spectrometry depth profiling
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OpenAlex topics: Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis · Diamond and Carbon-based Materials Research
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References (11)
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9. D.P. Chu, M.G. Dowsett, T.J. Ormsby, G.A. Cooke, Proceedings of 1998 International Conference on Characterization and Metrology for ULSI Technology, NIST, Gaithersburg, MD, AIP, New York, March 1998 (to be published).10.1063/1.56864 ↗
10. Wittmaack · J. Vac. Sci. Technol. A · 1990 · 8 · 224610.1116/1.576744 ↗
11. D.P. Chu, T.J. Ormsby, M.G. Dowsett, to be published.