PES and LEED study of hydrogen- and oxygen-terminated 6H–SiC(0 0 0 1) and surfaces

journal article·2001-12

N. Sieber, Th. Seyller, R. Graupner, L. Ley, R. Mikalo, P. Hoffmann, D.R. Batchelor, D. Schmeißer

Applied Surface Science· Volume 184· Issue 1-4

Bibliographic record

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

OpenAlex topics: Semiconductor materials and devices · Silicon Carbide Semiconductor Technologies · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Show source-provided references

1. Higashi · Appl. Phys. Lett. · 1990 · 56 · 65610.1063/1.102728 ↗

2. Gräf · J. Appl. Phys. · 1990 · 68 · 515610.1063/1.347056 ↗

3. Miyazaki · Appl. Phys. Lett. · 1996 · 68 · 124710.1063/1.115941 ↗

4. Yablonovitch · Phys. Rev. Lett. · 1986 · 57 · 24910.1103/PhysRevLett.57.249 ↗

5. Thoms · Appl. Phys. Lett. · 1994 · 65 · 295710.1063/1.112503 ↗

6. Küttel · Surf. Sci. · 1995 · 337 · L81210.1016/0039-6028(95)80041-7 ↗

7. Starke · Appl. Surf. Sci. · 1995 · 89 · 17510.1016/0169-4332(95)00024-0 ↗

8. Bernhardt · Appl. Phys. Lett. · 1999 · 74 · 108410.1063/1.123489 ↗

9. Hollering · Surf. Sci. · 1999 · 442 · 53110.1016/S0039-6028(99)00998-X ↗

10. Hollering · Mater. Sci. Forum · 2000 · 338–342 · 38710.4028/www.scientific.net/MSF.338-342.387 ↗

11. Lin · Appl. Phys. Lett. · 1993 · 62 · 70210.1063/1.108845 ↗

12. van Elsenbergen · Mater. Sci. Eng. B · 1997 · 46 · 36610.1016/S0921-5107(96)02007-7 ↗

13. Tsuchida · Appl. Phys. Lett. · 1997 · 70 · 307210.1063/1.119094 ↗

14. Tsuchida · J. Appl. Phys. · 1999 · 85 · 356910.1063/1.369716 ↗

15. Sieber · Appl. Phys. Lett. · 2001 · 78 · 121610.1063/1.1351845 ↗

16. Sieber · Mater. Sci. Forum · 2001 · 353–356 · 22310.4028/www.scientific.net/MSF.353-356.223 ↗

17. Sieber · Diam. Relat. Mater. · 2001 · 10 · 129110.1016/S0925-9635(00)00529-X ↗

18. W. Kern, Handbook of Semiconductor Wafer Cleaning Technology, Noyes Publications, Park Ridge, 1993.

19. Sieber · Mater. Sci. Forum · 2000 · 338–342 · 39110.4028/www.scientific.net/MSF.338-342.391 ↗