Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films
Source abstract
Abstract
Potential of O(2) remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O(2) remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er(2)O(3) and ZnO films. Furthermore, post-growth room-temperature remote O(2) plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO. lms
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: ZnO doping and properties · Electronic and Structural Properties of Oxides · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (24)
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