journal article·2020-01

Impact of germanium substrate orientation on morphological and structural properties of graphene grown by CVD method

Jakub Sitek, Iwona Pasternak, Justyna Grzonka, Jan Sobieski, Jaroslaw Judek, Pawel Dabrowski, Mariusz Zdrojek, Wlodek Strupinski

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Abstract

Abstract In this paper we study graphene synthesized on undoped (001), (110), and (111) Ge substrates, and show how the surface orientation and reconstruction affect its morphological and structural properties. The article presents the first attempt to explain the impact of germanium surface reconstruction on the shape and the density of graphene nuclei as well as on the material's stress and doping levels. Our findings suggest that graphene obtained on Ge(001) is the most uniform, with low doping (1.5 × 1012 cm−2) and low strain level (−0.1%). Graphene on Ge(110) appears to be highly compressed (−0.5%) while graphene on Ge(111) exhibits doping reaching 5 × 1013 cm−2. These results help to better understand the dynamics of graphene growth on germanium and indicate Ge(001), in terms of its structural properties, as the most promising orientation for the future CMOS applications.
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Research context

OpenAlex topics: Graphene research and applications · Semiconductor materials and devices · Diamond and Carbon-based Materials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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